| 摘要 |
PURPOSE:To reduce the number of shots and to improve a lithography through put by forming a beam by using an aperture formed to match a figure repeated ly presented in a pattern to be of lithography. CONSTITUTION:Variable beams are formed by using 1 plurality of sets of apertures 5 placed on a rodlike supporting plate clamped with a click stop type screw. The plurality of apertures 5 placed on the plate are formed in optimal shapes for the patterns predicted in advance for a lithography. In order to replace all the click stop type apertures 5, an electro-optical barrel may be locally down in vacuum with air locking valves 3, 4, and the apertures of another machine sets can be set in a short time. Thus, the lithography can be formed in a short time by selecting the aperture formed in response to the type and the layer of the pattern to be of the lithography.
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