Programmed pattern aligning device for a sewing machine

摘要

A pattern aligning device for a sewing machine having two two-dimensional pattern sensors, first and second computing means and first and second actuating mechanisms. Responsive to the two-dimensional pattern data sensed by the sensors, the first and second computing means compute the displacements between the patterns on the two sheets of material in two directions. The calculated displacements in the two directions are actuated by the first and the second actuating mechanisms to correct the alignment of the two sheets of material during sewing.