发明名称 APPLICATOR
摘要 PURPOSE:To prevent the abnormal thickening of the thickness of a resin near the center of a wafer, etc. by mounting a gas spraying nozzle spraying a gas near the center of a wafer when a resin is discharged from the nozzle or during revolution. CONSTITUTION:A gas 8 is sprayed near the center of a wafer 4 from a gas spraying nozzle 7 when a resist is discharged from a nozzle 6 or during revolution. Accordingly, the gas spraying nozzle spraying the gas against the center of the wafer is mounted, thus preventing the extreme thickening of the thickness of a resin in the vicinity of the center.
申请公布号 JPS63169728(A) 申请公布日期 1988.07.13
申请号 JP19870002309 申请日期 1987.01.07
申请人 MITSUBISHI ELECTRIC CORP 发明人 ARIMOTO ICHIRO
分类号 B05C11/08;G03F7/16;H01L21/027;H01L21/30 主分类号 B05C11/08
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