| 摘要 |
PURPOSE:To obtain a superior peeling agent for photoresist by incorporating a specified amt. of dimethyl sulfoxide and alcoholic compd. into the total amt. of the compsn. CONSTITUTION:Over 50vol.% of dimethyl sulfoxide and 5-50vol.% alcoholic compd., and >=0.01vol.% surface active agent based on the total volume of the compsn. are contained in the compsn. Suitable alcoholic compd. is satd. monohydric alcohol, e.g. butyl alcohol, amyl alcohol, hexyl alcohol, and several isomers thereof, and polyhydric alcohol, etc. Suitable surface active agent is most pref. nonionic surface active agent contg. no metal ion, e.g. fatty acid monoglycerol ester, etc. By this method, a peeling compsn. for photoresist having higher peeling effect than that exhibited by dimethyl sulfoxide or alcoholic compd. singly is provided even for a degradated and cured positive photoresist. |
