发明名称 PRODUCTION OF HIGH-PURITY HYDROGEN
摘要 PURPOSE:To obtain the title high-purity hydrogen useful for the metal refining and precision machining in the production of a semiconductor, by bringing methanol as the raw material and/or water into contact with gaseous H2 or the waste gas from the H2 refining to remove the dissolved air, vaporizing the liq., and carrying out catalytic reaction in the presence of a catalyst. CONSTITUTION:Prior to the supply of the raw material methanol and water to a reactor, the liq. mixture or the respective materials are supplied to a packed tower, for example, from the top, and allowed to flow down in the tower. Gaseous H2 or a part of the waste gas from the H2 refining are supplied to the tower from the bottom, and brought into countercurrent contact with the liq. to replace the air (especially gaseous N2) dissolved in the liq. with the gaseous H2 and to transfer the air to the gas side, and the air is purged. The liq. raw material (mixture) is heated and vaporized, the obtained gaseous mixture of methanol vapor and steam is subjected to reaction in the presence of a catalyst to form H2 and CO2, the CO2 is removed, and high-purity hydrogen is obtained.
申请公布号 JPS63162501(A) 申请公布日期 1988.07.06
申请号 JP19860307730 申请日期 1986.12.25
申请人 MARUTANI KAKOKI KK 发明人 USHIDA TAKURO
分类号 C01B3/32 主分类号 C01B3/32
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