| 摘要 |
PURPOSE:To form the pattern of an organic thin-film easily by shaping the pattern consisting of a region as a contact angle, where monomolecular films can be accumulated on the elevation of a substrate, and a region as a contact angle, where the monomolecular films cannot be accumulated on both the lowering and elevation of the substrate. CONSTITUTION:When a contact angle to pure water of the surface of a substrate is represented by theta, a pattern composed of a region A as a contact angle theta1, where monomolecular films can be accumulated on the lifting of the substrate, and a region B as a contact angle theta2, where the monomolecular films cannot be accumulated on both the descent and ascent of the substrate, is shaped. When the substrate is elevated and the monomolecular films are accumulated, the range of theta, where the monomolecular films can be accumulated, is limited between a section to a critical contact angle thetaa as a certain upper limit from 0 deg., and the thetaa does not exceed 90 deg.. Even when the substrate is brought down, the range of theta, where the monomolecular films can be accumulated, is limited between a section to theta<180 deg. from a critical contact angle thetab as a certain lower limit, and thetab takes approximately 90 deg.. thetaa does not exceed thetab, and there is a region as the contact angle, where an accumulation ratio is brought to 0 even when the substrate is moved in either direction of lifting or lowering. Accordingly, the contact angle theta1 ranges from 0 deg. to thetaa and theta2 from thetaa and thetab.
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