| 摘要 |
PURPOSE:To obtain a high contrast photoresist compsn. giving a fine pattern with high dimensional controllability by blending an alkalisoluble resin with a compd. having two or more naphtoquinone-1,2-diazido-5-sulfonyl groups and a specified compd. CONSTITUTION:An alkali-soluble resin as a film forming substance is blended with a compd. having two or more naphthoquinone-1,2-diazido-5-sulfonyl groups as a first photosensitive component and a specified monoester as a second photosensitive component to obtain a photoresist compsn. The monoester is prepd. by condensing an arom. compd. having a hydroxyl group in the molecule with naphthoquinone-1,2-diazido-5-sulfonyl chloride in the presence of weak alkali. The pref. ratio between the first and second photosensitive components is (1:0.5)-(1:3) and that of the photosensitive components and the alkali-soluble resin is (1:1)-(1:6). The resulting photoresist compsn. has high contrast and an accurately reproduce the dimensions of a fine pattern on a highly reflective substrate independently of a change in prebaking conditions. |
