| 摘要 |
PURPOSE:To obtain a crucible for evaporation source capable of stably forming a thin film of good quality with high heating efficiency, by detachably constituting, except in the innermost-layer part, a crucible body having a multilayered structure. CONSTITUTION:For example, in a crucible for cluster ion beam vapor deposition, an outer cover 4 and an inner cover 5 are provided to an outer layer 1 of the crucible and an inner layer 2 of the crucible, respectively, so as to be formed into a detachable multilayered structure, and all of them are formed of the same material such as graphite. Subsequently, the innermost layer 3, of the crucible, made of a material difficult to react with vapor deposition material, such as BN, is formed on the insides of the above inner layer 2 and inner cover 5 by means of a plasma CVD method, etc. The crucible of the above structure is heated to melt and evaporate a vapor deposition material 7 held in it, which is sprayed through a nozzle 6 to carry out film formation. By the above construc tion, heating efficiency is improved, contamination of the vapor deposition material 7 by impurities can be prevented, and, even if the inner-layer part is broken, the influence on the outer-layer part can be prevented. |
