发明名称 TARGET FOR SPUTTERING
摘要 PURPOSE:To make the compsn. of thin films uniform, by arranging plural sectorial sections made of one of the constituents of a thin alloy or compd. film around the center of a target. CONSTITUTION:A metal- or nonmetal-base target body 2 is prepd. and plural sections 5 made of other metal or nonmetal is arranged on the body 2. The sections 5 may be sectorial sections having the same ratio in length in the circumferential direction at radial positions within a certain range. When the resulting target is used, the compsn. of thin films formed on substrates 6 is made uniform.
申请公布号 JPS63157864(A) 申请公布日期 1988.06.30
申请号 JP19860302004 申请日期 1986.12.18
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 MATSUBARA KUNIHIRO;OTA TAKEO;INOUE ISAMU;YOSHIOKA KAZUMI
分类号 C23C14/34;G11B7/26 主分类号 C23C14/34
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