发明名称 Self-aligned contacts for bipolar process
摘要 A process for manufacturing a bipolar semiconductor device having self-aligned contact regions. The process avoids the need for a masking step for the application of interconnecting contacts by providing a dielectric material having a low melting point over the emitter region of the semiconductor. The dielectric material is heated to its melting point such that it covers and encapsulates the emitter. Conductive contact material is then subsequently provided using the self-alignment feature of the melted dielectric which isolates the base from the contacts.
申请公布号 US4752591(A) 申请公布日期 1988.06.21
申请号 US19870062309 申请日期 1987.06.15
申请人 HARRIS CORPORATION 发明人 BEITMAN, BRUCE A.
分类号 H01L21/285;H01L21/3105;H01L21/768;(IPC1-7):H01L21/283 主分类号 H01L21/285
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