| 摘要 |
PURPOSE:To enable a pattern of a semiconductor device having a size larger than that of an exposure range of a light source and a lens of an exposure apparatus to be transferred, by arranging a mask having a size larger than that of the projectable range and moving also mask, in addition to a semiconductor substrate which would be moved along according to prior arts, in synchronization with movement of the semiconductor substrate. CONSTITUTION:In a reducing projection exposure apparatus having an ultraviolet radiation light source 11, a mask holder 12, a reducing projection lens 13 and a sample material stage 14, a holder 12 has a size larger than that of the visual field of the lens by integral times. Predetermined regions of the holder 12 are moved by steps successively onto the visual field of the lens by a mask moving mechanism 15. The sample stage 14 is moved by steps by a moving mechanism 16 synchronously with the step movement of the holder 12, so that all the regions on the holder 12 are projected on the material stage by the light source. Further, the stage is adapted in the manner such that it can be moved in the X- and Y-directions by the same or different moving mechanisms 15 and 16, independently from the movement of the holder 12. |
