| 摘要 |
<p>A vacuum evaporating apparatus for depositing thin films on a substrate comprises a tank (21), a hot-wall furnance (54)for heating and evaporating a material to be evaporated, an auxiliary vacuuming means (22) connected to the vacuum tank through a gate valve (GV), a substrate exchanging mechanism (23) for an evaporated substrate (W) with a new substrate through the auxiliary vacuuming device, and a substrate transferring unit generally of a turn table (43) located to be rotatable above the hot-wall furnace. A plurality of hot-wall furnaces are disposed in standing state in the vacuum tank, each of hot-wall furnaces being provided with a plurality of crucibles (56,57) coaxial in a vertical direction in which the evaporation source materials are accommodated, heaters (58,59) independently provided for the respective crucibles, and thermocouples (60,61) connected to the respective heaters to independently control the temperatures of the respective crucibles. The thermocouples are operatively connected to socket pins (65,62), at the bottom of the hot-wall furnace, made of the same materials as those constituting metal portions of the respective thermocouples.</p> |
