| 摘要 |
PURPOSE:To increase the efficiency of photo absorption and thus improve the characteristic by a method wherein the surface of a transparent conductive film formed on a clear electrode is formed into a rough grain surface. CONSTITUTION:The titled device is composed by evaporating the transparent conductive film 5 on a glass 6, laminating P-amorphous Si 4, I-one 3, and N-one 2 successively thereon, and attaching a metallic electrode 1 further thereon. Said film of the clear electrode 5 is formed by evaporating ITO (indium tin oxide) or ITO+SnO2 on the surface of the glass 6 by an electron beam vapor deposition method. Here, reflection loss reduces, and the efficiency of photo absorption increases by forming the surface of said film into a rough surface. |
