| 摘要 |
<p>The invention relates to a process for the continuous cleaning of an elongated substrate, such as a wire, a strip, a cord, etc., whereby the substrate (11) to be cleaned is guided through a high vacuum chamber (12, 13), whereby an inert sputtering gas , such as argon, is introduced into this chamber and a sufficiently high voltage difference and current is maintained between the substrate (11) used as cathode and an anode (18) present in the chamber, so that an electrical discharge occurs between these two electrodes, as a result of which the substrate (11) is cleaned by the impact of inert gas ions when passing through the vacuum chamber (12, 13).</p> |
