发明名称 METHOD FOR RECOVERING VAPOR DEPOSIT
摘要 <p>PURPOSE:To recover a metal vapor deposit at a low cost, by allowing a low-m. p. liquid metal to flow on the metal vapor deposit so as to melt the metal vapor deposit in the liquid metal and by recovering the metal vapor deposit in the liquid metal. CONSTITUTION:A high-m.p. metal vapor current 3 (e.g., uranium, etc.) is prepared from a mixture 2 in a crucible 1 in a vacuum vessel and then the high-m. p. metal 5 is vapor-deposited onto a vapor-deposition substrate 4. When the low-m.p. liquid metal 7 (e.g., mercury) capable of melting the high-m.p. metal 5 is allowed to flow on the above high-m.p. metal 5, the high-m.p. metal 5 can be recovered into a vessel 8 by means of the low-m.p. liquid metal 7. Further, the low-m.p. liquid metal 7 is used by circulation by the use of a pump 9. In this way, the high-m.p. metal vapor deposit 5 recovered in the liquid metal 7 can be easily recovered by evaporating the liquid metal 7.</p>
申请公布号 JPS63134637(A) 申请公布日期 1988.06.07
申请号 JP19860279763 申请日期 1986.11.26
申请人 JAPAN ATOM ENERGY RES INST 发明人 SHIBATA TAKEYOSHI
分类号 C22B9/02 主分类号 C22B9/02
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