| 摘要 |
<p>PURPOSE:To prevent a defect in orientation from being caused by forming a flat color filter of a thin film on a substrate without any gap between picture elements. CONSTITUTION:Resist films 63 and 67 of positive type photoresist are formed on the substrate 61 where the 1st and the 2nd pigment films 62 and 66 are formed and exposed to photosensitive wavelength light through the substrate 61, and development is carried out to form resist patterns 63' and 67' provided with the resist films on the 1st and the 2nd pigment films 62 and 66. Then the 3rd pigment layer 38 with transmission characteristics to the photosensitive wavelength light of the positive type resist is formed and developed, and the resist patterns 63' and 67' are removed to form the 3rd pigment film 68 which is patterned, thereby forming the pigment films 62, 66, and 68 of respective picture elements of a color filter flatly without any gap. Thus, a defect in orientation is prevented from being caused.</p> |
