| 摘要 |
PURPOSE:To obtain the titled device wherein the direction of scatter of sputtered particles is always made constant and uniform film quality is obtained by constituting the device so that a shifting magnetic field is formed by a plurality of conductors fed with current respectively from each phase of a polyphase AC electric source parallel arranged on the surface of a target. CONSTITUTION:In case of forming a shifting magnetic field on the surface of a target, the intensity of the magnetic field formed parallel to the surface of the target differs at a same time point according to the position in the surface direction. The average value of intensity of the above-mentioned magnetic field, however, becames equal all over the surface of the target and therefore the density of plasma formed on the front surface of the target is uniformized. Thereby the generation of particles sputtered from the target is uniformly performed in a range all over the surface of the target and a thin film having uniform film quality is formed on the opposite base plate surface.
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