发明名称 METHOD FOR CLEANING SUBSTRATE SURFACE
摘要 PURPOSE:To completely remove the grinding soln. of a water-soluble lubricant by applying alkaline processing soln. dipping treatment, alkali degreasing treatment, and neutralization treatment to the surface of a substrate textured with the water-soluble lubricant as the grinding soln. CONSTITUTION:The surface of the substrate 1 deposited with the grinding soln. of a water-soluble lubricant is firstly washed with a pure water shower to wash away the abrasive grains remaining and deposited on the surface during texturing. The washed substrate 1 is dipped in an NaOH vessel (200g NaOH in 1l pure water), and treated with the alkali. The alkali-treated substrate 1 is then washed with a pure water shower to wash away the NaOH. The washed substrate 1 is subsequently dipped in an alkaline degreasing agent, and degreased. The alkaline degreasing agent is then washed away by a pure water shower, the substrate is dipped in a sulfuric acid vessel as neutralization treatment, and the sulfuric acid soln. is washed away by a pure water shower. The substrate is finally dried by using a spin dryer, and the grinding soln. is completely removed from the surface of the substrate.
申请公布号 JPS63128188(A) 申请公布日期 1988.05.31
申请号 JP19860273604 申请日期 1986.11.17
申请人 SEIKO EPSON CORP 发明人 IIDA KAZUO
分类号 C23G1/14 主分类号 C23G1/14
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