FORMATION OF DEPOSITED FILM

摘要

PURPOSE:To improve the rate of deposition and to simplify controlling for film formation conditions by introducing a precursor which is a raw material for forming a deposited film and active species for applying activity thereto respectively separately into a deposition space. CONSTITUTION:The precursor which is a raw material for forming the deposited film but does not form the deposited film in the energy state as it is formed in a cracking chamber 2. The active species which forms the deposited film by inducing a chemical interaction with the above-mentioned precursor is formed in the cracking space 3. The active species and the above-mentioned precursor are respectively separately introduced through an active species introducing pipe 10 and a precursor introducing pipe 7 into a deposition space 1, by which the deposited film is formed on a substrate.