发明名称 |
PRODUCTION OF SILICON SINGLE CRYSTAL |
摘要 |
PURPOSE:To produce the titled single crystal in high efficiency, suppressing the generation of dislocation caused by the lattice strain induced by dopant atom, by dipping a seed crystal in inclined state into molten polycrystalline silicon added with a dopant and pulling up the seed crystal. CONSTITUTION:A seed crystal is dipped in molten polycrystalline silicon added with a dopant such as Sb in a state inclining the crystal face of the seed crystal from pulling up crystal face (<111> and <100>) of the single crystal to be produced by 0.2-4 deg. and is pulled up from the molten silicon to obtain the objective single crystal.
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申请公布号 |
JPS63123893(A) |
申请公布日期 |
1988.05.27 |
申请号 |
JP19860270772 |
申请日期 |
1986.11.13 |
申请人 |
MITSUBISHI METAL CORP;JAPAN SILICON CO LTD |
发明人 |
KONNO SHOICHI;ISHIGAMI SHUNICHIRO |
分类号 |
C30B15/04;C30B15/36;C30B29/06;H01L21/18 |
主分类号 |
C30B15/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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