发明名称 PRODUCTION OF SILICON SINGLE CRYSTAL
摘要 PURPOSE:To produce the titled single crystal in high efficiency, suppressing the generation of dislocation caused by the lattice strain induced by dopant atom, by dipping a seed crystal in inclined state into molten polycrystalline silicon added with a dopant and pulling up the seed crystal. CONSTITUTION:A seed crystal is dipped in molten polycrystalline silicon added with a dopant such as Sb in a state inclining the crystal face of the seed crystal from pulling up crystal face (<111> and <100>) of the single crystal to be produced by 0.2-4 deg. and is pulled up from the molten silicon to obtain the objective single crystal.
申请公布号 JPS63123893(A) 申请公布日期 1988.05.27
申请号 JP19860270772 申请日期 1986.11.13
申请人 MITSUBISHI METAL CORP;JAPAN SILICON CO LTD 发明人 KONNO SHOICHI;ISHIGAMI SHUNICHIRO
分类号 C30B15/04;C30B15/36;C30B29/06;H01L21/18 主分类号 C30B15/04
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