| 摘要 |
PURPOSE:To attain exposing control with high accuracy by obtaining an optimum exposing quantity with high accuracy by an automatic diaphragming to weighted to a screen and executing a direct photometry based on it. CONSTITUTION:A photometric pattern selected from a pattern presetting device 83 is inputted to a control circuit 8. The light from object passes through a lens 2, a diaphragm 3, a half mirror 4 and a shutter 8, and is made incident on a sensor 6. The image pickup output from a sensor 6 is transferred to a recording part 62 as a video signal inputted from an incident light to a camera circuit 61. The video signal displayed at a terminal 610 is inputted to a gate 7. A gate signal from a gate pattern generating device 71 is inputted to the gate 7, and the video signal weighted by the light measuring pattern due to the pulse is inputted to an automatic diaphragming circuit 33. At such a time, the output of a photometric circuit 41, in which the light from an object 1 is made incident from a half mirror 4, shows a suitable exposing quantity.
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