METHOD AND DEVICE FOR ETCHING CHROMIUM FILM

摘要

PURPOSE:To efficiently etch away the chromium film in exposed parts of a resist pattern by forming the resist pattern on a substrate having the chromium film and supplying an etching soln. while bringing metal copper into contact with the exposed parts of the resist pattern. CONSTITUTION:The Cr film 3 is formed on the glass substrate 2, and while the substrate 1 which is to be etched and on which the pattern is formed of the photoresist film 4 is conveyed by a roller 5, an aq. HCl soln. as the etching soln. is injected from plural nozzles 10. A rolling roller 11 made of Cu is kept rotated around a shaft 12 thereof and is brought into contact with the part 1a of the Cr film 3 on the substrate 1 where the Cr film 3 is exposed without being coated by the resist film 4. The chromium film which is exposed in the absence of the resist film 4 is quickly etched way by the catalytic effect of Cu and the roller 11 made of Cu is less consumed. Finally, the resist film 4 is stripped off and the Cr film etched to the pattern shape is obtd.