| 摘要 |
<p>of the Invention Chemical vapor deposition reaction chamber glassware includes an upper reaction chamber cover and a wafer boat support plate. A gas collector means has an upper edge supporting the wafer boat support, and the upper portion thereof communicates with gas flow openings in the wafer support plate for removal of spent CVD gases from the reaction chamber. Gas injectors enclosed within the gas collectors pass upwardly through the wafer support plate. Unique wafer boats of several types are supported on the wafer boat support.</p> |
