| 摘要 |
PURPOSE:To control the vapor pressure of an easily evaporable element in a treatment chamber at a desired value at all times even when a temperature changes by providing a pressure control means altering the internal volume of a communicating space communicating with the treatment chamber in response to fluctuations in the vapor pressure of the easily evaporable element in a liquid epitaxial growth device and a semiconductor thermal treatment equipment. CONSTITUTION:In an epitaxial growth device, blocking members 65 inserted into opening sections 64 in each boat 6 are slid in the opening sections 64 in response to the fluctuation of the vapor pressure of an easily evaporable element, thus changing the internal volume of communicating spaces. Accordingly, vapor pressure in a treatment chamber 62 is controlled to a desired value at all times.
|
