发明名称 WAFER CONVEYING MECHANISM
摘要 <p>PURPOSE:To prevent dust or the like from sticking to the backside of a wafer as well as to keep off any drop in yield of a product obtainable from top of the water in the after-process, by pivotally supporting a set of large diametral rollers, supporting the wafer and giving feed to it, on a turning shaft parallelly. CONSTITUTION:When a wafer is supported by large diametral rollers 5c and 4c at the rightmost end and rollers 5b and 4b in front of them, each large diametral roller gives left feed to the wafer as rotating and the wafer is supported by the large diametral roller one after another, giving the feed force to each, conveying it in succession. Accordingly, such one that comes into contact with the backside of the wafer is the large diametral roller made of fluorocarbon resin excellent in wear resistance such as Teflon or the like, so that occurrence of dust is held down to minimum, while a contact area to the wafer backside can be minimized. And, since it is of a roller contact type, any dust from a belt is not transferred to the wafer backside, thus any drop in yield of a product obtainable from top of the wafer by resticking or the like onto a surface of the wafer in the after-process is preventable.</p>
申请公布号 JPS63112349(A) 申请公布日期 1988.05.17
申请号 JP19860258741 申请日期 1986.10.30
申请人 YAMAGUCHI NIPPON DENKI KK 发明人 NAKATANI KENJI
分类号 B65H5/06;B65G49/07;H01L21/677;H01L21/68 主分类号 B65H5/06
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