| 摘要 |
PURPOSE:To contrive to obtain a high-grade cleaning result by a method wherein the title device is provided with a ultrasonic generating unit for generating an ultrasonic wave in a cleaning tank. CONSTITUTION:Si substrate 3 housed in a substrate cassette 4 are cleansed with chemical supplied from an ammonia water tank 5 and a hydrogen peroxide tank 6 in a cleaning tank 1. At this time, if an ultrasonic wave is simultaneously applied in the cleaning tank 1 by an ultrasonic generating unit 7, the force of a contaminant adhered on the substrate surfaces is weakened by high-frequency vibration generated by the ultrasonic wave and the contaminant is quickly desorbed from the substrates. Thereby, even through a cleaning treatment is performed under normal temperatures, an enough cleaning power can be fulfilled and furthermore, as the treatment can be performed under normal temperatures, the concentration control of the chemical can be easily executed. As a result, the control of a process becomes easier and a high-grade cleaning result can be obtained.
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