发明名称 MANUFACTURE OF SEMICONDUCTOR CLEANING SUPERPURE WATER
摘要 PURPOSE:To minimize deterioration of quality of superpure water due to passing through tubes, by providing subsystems near semiconductor cleaning apparatuses. CONSTITUTION:Raw water 4 is treated by a primary water processing apparatus 3 and primary pure water is supplied to subsystems 7A-7C through a tube 5 of PVC or the like. Superpure water obtained from the subsystems 7A-7C is supplied to cleaning apparatuses 1A-1C through tubes 9A-9C, respectively, and cleaned. The tubes 9A-9C and 13A-13C made of ethylene fluoride in which impurities are hardly dissolved and in which bacteria hardly propagate are particularly effective for ensuring high quality of water.
申请公布号 JPS63108724(A) 申请公布日期 1988.05.13
申请号 JP19860253594 申请日期 1986.10.27
申请人 JAPAN ORGANO CO LTD 发明人 YOKOYAMA FUMIO
分类号 H01L21/304;C02F1/44;C02F9/00 主分类号 H01L21/304
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