Method of compensating for absorber-induced distortions on X-ray masks

摘要

In a method of compensating for absorber-induced distortions on X-ray masks having special measuring marks which enable an absolute determination of the mask distortions by optical or electron-optical means, the distortions found are compensated for by a surface-wide implantation immediately after the absorber has been patterned. The distortions found can also be corrected locally by a positionally dependent dosage distribution using implantation with a focused ion beam.