Vacuum processing method and apparatus.

摘要

A vacuum processing method and apparatus in which a DC bias to be produced on the surfaces of substrates which are to be processed in a vacuum chamber (1) can be mechanically and easily controlled by adjusting the position of a susceptor (11) in respect to an electrode body (12), and the susceptor (11) and other components in the vacuum chamber (1) can be easily cleaned while maintaining a desired evacuated condition and a desired processing performance in the vacuum chamber (1).