发明名称 |
PRODUCTION OF OPTICAL CIRCUIT ELEMENT |
摘要 |
PURPOSE:To permit formation of a rugged pattern constituting an optical circuit element with an ordinary UV exposing device by using a material which is formed by sintering after putting the same into a sol state and gel state as an optical waveguide layer or a substrate for supporting said layer. CONSTITUTION:A sol soln. 22 which forms quartz when subjected to a gelling and sintering stage is put into a vessel 21. After the soln. is gelled, a mold 24 expanded in the size of a grating is pressed to a gel 23. The size of the gel is reduced by about half when the gel is subjected to drying and sintering in a port stage. The gel 23 transferred with the mold 24 is dried and is then sintered at a temp. lower than the temp. for finally forming the quartz to form a sintered gel 25. Ge is diffused successively onto the surface of the sintered gel 25 in a soln. prepd. by dissolving tetraethoxy germanium into ethanol to change the refractive index and to form a diffused layer 26. Sintering is further executed to form a quartz substrate 11 having the grating 13 and the optical waveguide layer 12 on the surface. |
申请公布号 |
JPS63100406(A) |
申请公布日期 |
1988.05.02 |
申请号 |
JP19860271405 |
申请日期 |
1986.11.14 |
申请人 |
SEIKO EPSON CORP |
发明人 |
YOKOYAMA OSAMU;MATSUO MASATAKE |
分类号 |
G11B7/135;G02B6/124;G02B6/13;G11B7/22 |
主分类号 |
G11B7/135 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|