发明名称 PRODUCTION OF OPTICAL CIRCUIT ELEMENT
摘要 PURPOSE:To permit formation of a rugged pattern constituting an optical circuit element with an ordinary UV exposing device by using a material which is formed by sintering after putting the same into a sol state and gel state as an optical waveguide layer or a substrate for supporting said layer. CONSTITUTION:A sol soln. 22 which forms quartz when subjected to a gelling and sintering stage is put into a vessel 21. After the soln. is gelled, a mold 24 expanded in the size of a grating is pressed to a gel 23. The size of the gel is reduced by about half when the gel is subjected to drying and sintering in a port stage. The gel 23 transferred with the mold 24 is dried and is then sintered at a temp. lower than the temp. for finally forming the quartz to form a sintered gel 25. Ge is diffused successively onto the surface of the sintered gel 25 in a soln. prepd. by dissolving tetraethoxy germanium into ethanol to change the refractive index and to form a diffused layer 26. Sintering is further executed to form a quartz substrate 11 having the grating 13 and the optical waveguide layer 12 on the surface.
申请公布号 JPS63100406(A) 申请公布日期 1988.05.02
申请号 JP19860271405 申请日期 1986.11.14
申请人 SEIKO EPSON CORP 发明人 YOKOYAMA OSAMU;MATSUO MASATAKE
分类号 G11B7/135;G02B6/124;G02B6/13;G11B7/22 主分类号 G11B7/135
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