| 摘要 |
PURPOSE:To obtain excellent preservation and stability of the titled material for a long period, and at the same time, to prevent dissolution of a photoresist in case of providing a thin film of the titled material on the photoresist by using a specific compd. for a photodiscoloring compd., and by incorporating a combination of said compd. and a water soluble high polymer binder to the titled material. CONSTITUTION:The titled material comprises at least one kind of the photodiscoloring compd. selected from the compd. having two constituting units shown by formula I and the water soluble high polymer binder. In formula I, Z is a residual group capable of forming a nitrogen contg. aromatic heterocyclic ring together with nitrogen atom, X<-> is a monovalent anionic residual group, (n) is an integer of >=1, another end of an ethylenic unsatd. group is bound to an aromatic ring group. Thus, the excellent characteristics of the titled material, such as excellent stability for long period, and less tendency for dissolving the photoresist in case of providing the thin film of the titled material on the photoresist, and unnecessity of a step of removing said thin film before processing the image, etc., ate obtd. |
