| 摘要 |
<p>PURPOSE:To obtain good tracking and C/N by using an oxide magnetic material layer as a recording layer and combining said layer and band-shaped reflection layers. CONSTITUTION:A photoresist 23 is coated on a material 20 forming the oxide magnetic material layer 13 and reflection film 14 on a substrate 11. A photomask 33 having a prescribed pattern is brought into tight contact with the surface thereof and UV light is projected thereto. The resist is then developed to remove the unirradiated part, by which a resist pattern 25 is formed on the film 14. The film 14 in the part where the pattern 25 is not formed is further removed by etching, then the pattern 25 is stripped to form the band- shaped reflection layers 15. The good tracking and C/N are thereby obtd. and the productivity is improved.</p> |
