发明名称 PROCESS FOR DEPOSITING LAYERS OF DIAMOND
摘要 A process for depositing diamond (12) onto a substrate (14), which is of particular utility in fabricating very thin layers of diamond. Diamond (12) is deposited by chemical vapor deposition of a hydrocarbon vapor wherein the carbon atoms are saturated and the ratio of hydrogen atoms linked to carbon atoms is less than 2. That is, the carbon atoms of the hydrocarbon are bonded by single bonds at an angle near 109.5 degrees, the same angle required for the carbon atoms in the deposited diamond. The limited number of hydrogen atoms ensures a compact structure for the hydrocarbon, and reduces the system burden of removing excess hydrogen upon deposition. The polycyclic alkanes exhibit the required structures. Preferred hydrocarbons include adamantane (Fig. 2), congressane (Fig. 3), cubane (Fig. 4), and basketane (Fig. 5).
申请公布号 WO8802792(A1) 申请公布日期 1988.04.21
申请号 WO1987US02251 申请日期 1987.09.08
申请人 HUGHES AIRCRAFT COMPANY 发明人 PASTOR, RICARDO, C.
分类号 C30B29/04;B23P15/28;C01B31/06;C23C16/27;C30B25/02 主分类号 C30B29/04
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