| 摘要 |
PURPOSE:To improve dry-etching resistance of the titled composition by incorporating the trimethylsilyl ether compd. of a polycondensate of polyhydroxy phenol and ketone or aldehyde, and a o-quinone diazide compd. to the titled composition. CONSTITUTION:The titled composition comprises the tri-methylsilyl ether compd. of the polycondensate of polyhydroxy phenol and ketone or aldehyde, and the o-quinone diazide compd. The polyhydroxy phenol is exemplified by resorcin, pyrogallol, phloroglucin and catechol, etc. The ketone or aldehyde is exemplified by acetone, formaldehyde, acetoaldehyde and benzaldehyde, etc. The o-quinone diazide compd. is exemplified by the condensate of a novolak resin and o- quinone diazido sulfonyl chloride, and the condensate of a various phenol compd. and o-quinone diazidosulfonyl chloride. Thus, the titled composition having high sensitivity, high resolution and excellent resistance against dryetching at oxygen gas atmosphere is obtd. |
