发明名称 |
An improved process for preparing a charge coupled device with charge transfer direction biasing implants. |
摘要 |
<p>A process is disclosed of preparing a charge coupled device containing charge transfer direction biasing implants wherein the steps and materials for patterning electrodes and implants promote accurate edge alignments of implants and electrodes while minimizing strains and avoiding temperatures that permit unwanted lattice or intersticial ion migration in the semiconductive substrate.</p> |
申请公布号 |
EP0263341(A2) |
申请公布日期 |
1988.04.13 |
申请号 |
EP19870113724 |
申请日期 |
1987.09.20 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
HAWKINS, GILBERT ALLAN EASTMAN KODAK COMPANY;NIELSEN, ROBERT LEROY EASTMAN KODAK COMPANY;LOSEE, DAVID LAWRENCE EASTMAN KODAK COMPANY |
分类号 |
H01L29/762;H01L21/339;H01L29/768 |
主分类号 |
H01L29/762 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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