| 摘要 |
PURPOSE:To steadily form the functional deposited film with high efficiency by the title method by providing a gaseous atmosphere sealing means having specified surface roughness between a micro-wave introducing window for introducing microwave energy and the wall of a vacuum vessel. CONSTITUTION:The microwave 106 is introduced into the vacuum vessel through the microwave introducing window 102 consisting of a microwave transmitting substance, and the functional deposited film is formed on a substrate in the vacuum vessel by the microwave plasma CVD method. At this time, a material having <=3.2 S surface roughness is used for a gaseous atmosphere keeping gasket 103 to be used for sealing the gap between the wall surface 101 of the vacuum vessel and the microwave introducing window 102. For example, when the microwave introducing window 102 is made of an alumina ceramic, an O ring of aluminum is preferably used as the gasket 103. By this method, a good-quality deposited film can be stably formed on a long and large-sized substrate at a high film forming rate. |
