发明名称 |
Radiation-resistant high molecular composition. |
摘要 |
<p>A radiation-resistant high molecular composition is disclosed, which comprises a high molecular polymer, a halogenated acenaphthylene and/or condensate thereof represented by the following general formula [I] <CHEM> (wherein X indicates a chlorine or bromine atom, a indicates 0 to 2, b indicates 1 to 6 and n indicates an integer not less than 1), a diphenyl ether derivative represented by the following general formula [II] <CHEM> (wherein R1 and R2 indicate a hydrogen atom, an alkyl, alkoxy, phenyl phenoxy, diphenyloxy or a terphenyloxy group) and/or a basic lead compound.</p> |
申请公布号 |
EP0261638(A2) |
申请公布日期 |
1988.03.30 |
申请号 |
EP19870113828 |
申请日期 |
1987.09.22 |
申请人 |
TOSOH CORPORATION;FURUKAWA ELECTRIC CO., LTD. |
发明人 |
KUBO, MASASHIGE;TSUTSUMI, YUKIHIRO;OKISAKI, FUMIO;FUJIMURA, SHUNICHI;FUKUDA, TERUO |
分类号 |
C08K3/00;C08K5/03;C08K5/06;H01B3/30 |
主分类号 |
C08K3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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