发明名称 Radiation-resistant high molecular composition.
摘要 <p>A radiation-resistant high molecular composition is disclosed, which comprises a high molecular polymer, a halogenated acenaphthylene and/or condensate thereof represented by the following general formula [I] <CHEM> (wherein X indicates a chlorine or bromine atom, a indicates 0 to 2, b indicates 1 to 6 and n indicates an integer not less than 1), a diphenyl ether derivative represented by the following general formula [II] <CHEM> (wherein R1 and R2 indicate a hydrogen atom, an alkyl, alkoxy, phenyl phenoxy, diphenyloxy or a terphenyloxy group) and/or a basic lead compound.</p>
申请公布号 EP0261638(A2) 申请公布日期 1988.03.30
申请号 EP19870113828 申请日期 1987.09.22
申请人 TOSOH CORPORATION;FURUKAWA ELECTRIC CO., LTD. 发明人 KUBO, MASASHIGE;TSUTSUMI, YUKIHIRO;OKISAKI, FUMIO;FUJIMURA, SHUNICHI;FUKUDA, TERUO
分类号 C08K3/00;C08K5/03;C08K5/06;H01B3/30 主分类号 C08K3/00
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