发明名称 MONOCRYSTALLINE THREE-DIMENSIONAL INTEGRATED CIRCUIT
摘要 A single-crystal monolith containing a 3-D doping pattern forming varied devices and circuits that are junction-isolated. The semiconductor monolith includes interconnecting signal paths and power buses, also junction-isolated, usually with N+ regions within P matrix regions, and tunnel junctions, N+ - P+ junctions, as ohmic contacts from N-type to P-type regions. An isolating box incorporates an orthogonal isolator. The 3-D structure places layers of critical profile normal to the growth axis. The orthogonal isolator can include floating elements. The 3-D semiconductor monolith can be manufactured through continuous or quasicontinuous processing in a closed system, such as through MBE or sputter epitaxy. Also, a thin layer of silicide can be provided as an ohmic contact and/or a thick layer of silicide can be provided as a conductor thereby providing monocrystalline 3-D devices or integrated circuits. Finally, an insulator can be provided about an entire device for isolation.
申请公布号 WO8801829(A2) 申请公布日期 1988.03.24
申请号 WO1987US01095 申请日期 1987.05.08
申请人 REGENTS OF THE UNIVERSITY OF MINNESOTA 发明人 WARNER, RAYMOND, M., JR.;SCHRIMPF, RONALD, D.;TUSZYNSKI, ALFONS
分类号 H01L21/74;H01L21/76;H01L21/761;H01L21/822;H01L27/06;H01L29/808 主分类号 H01L21/74
代理机构 代理人
主权项
地址