发明名称 Vertical photoresist developer
摘要 Vertical photoresist developer for processing of any size of printed circuit boards carried on a processing cassette. The processing cassette is carried by a chain through a main chamber, a rinse chamber and a drying chamber, all the processing chambers in line with each other. The processing system is electromechanical and electrically controlled, as well as air and liquid flow control. The developer is system oriented and symmetrical in operation to either side of the board.
申请公布号 US4732173(A) 申请公布日期 1988.03.22
申请号 US19850796933 申请日期 1985.12.20
申请人 CIRCUIT CHEMISTRY CORPORATION 发明人 CZAJA, JAMES J.;HERRMANN, JOHN J.
分类号 G03F7/30;H05K3/00;(IPC1-7):B08B3/02 主分类号 G03F7/30
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