| 摘要 |
<p>This invention provides an infrared intensive heating-type floating zone melting apparatus which has a small temperature gradient in the circumferential direction of a sample in a melting part, exhibits a steep temperature gradient in the vertical direction, can realize a satisfactorily high highest attainable temperature and can form a stable molten state. The floating zone melting apparatus is a four elliptical mirror-type floating zone melting apparatus comprising rotary ellipsoid reflectors (2) disposed opposite to each other on an orthogonal axis. In this apparatus, the eccentricity of the rotary ellipsoid reflector (2) is 0.4 to 0.65, and the ratio of the depth of the rotary ellipsoid reflector (2) to the diameter of an opening in the rotary ellipsoid reflector (2) is 0.38 to 0.75. A glass mirror was used as the rotary ellipsoid reflector (2). Further, the rotary ellipsoid reflector (2) is disposed so that a straight line from one focal point to the other focal point is slanted downward, and infrared light reflected from the reflecting surface is applied to a sample from an oblique top direction, whereby a large-diameter single crystal can be grown.</p> |
