| 摘要 |
PURPOSE:To extend the effective focal length in the projecting exposure process by a method wherein focussing surfaces are set up at multiple positions relatively different from a resist layer on an optical axis to be exposed simultaneously or stepwise or exposed while continuously changing the resist layer on the optical axis. CONSTITUTION:A substrate 1 is coated with photoresist to form a photoresist layer 2 and thin a pattern is exposed thereon using a projecting exposure device to be developed later. At this time, after firstly exposing the pattern at the position of focussing point of light 6 (the first focussing point), a stage fixed to the substrate 1 is shifted in the optical axis direction to expose the pattern for the second time at the position 4 specifically different from the first focussing point 3 in the optical axis direction as another focussing point (the second focussing point). Through these procedures, the focal length can be extended so that a fine pattern may be formed with high precision regardless of any step difference on the surface. |
