发明名称 Drying method for objects cleaned in liquid bath - blowing with gas immediately on removal from bath after lithographic process e.g. for printed circuit
摘要 The objects being cleaned immersed in a bath of cleaning liquid. The liquid is then run off and at the same time a gas is used to blow residual liquid from the objects to dry them. The liquid is pure water or isopropanol. The liquid is then run off and at the same time a gas is used to blow residual liquid from the objectsd to dry them. The liquid is pure water or isopropanol. The liquid is blown off within a given time. Above the bath level an atmosphere is produced consisting of the blowing drying gas. The gas may be pure air or an inert gas or another type. The gas is blown at the objects from one or more directions. USE/ADVANTAGE - No drying marks are formed on objects. E.g in PCB manufacture.
申请公布号 CH664212(A5) 申请公布日期 1988.02.15
申请号 CH19850000688 申请日期 1985.02.13
申请人 ROAG (AG) 发明人 SUTER, HANS RENE
分类号 F26B5/00;F26B21/14;H05K3/22;(IPC1-7):F26B5/00;B05D3/04;B08B5/00;H01L21/30 主分类号 F26B5/00
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