| 摘要 |
PURPOSE:To prevent the swirling-up of dust and to make it possible to easily perform necessary maintenance, by making a base plate for supporting a specimen to be treated detachable and movable to the main body of a reaction furnace while enabling the take-in and take-out of an assembly including a high frequency electrode to the interior of the furnace. CONSTITUTION:In a reaction apparatus constituted so that a high frequency electrode is inserted into a reaction furnace 4 to be placed therein and reaction gas introduced into the reaction furnace 4 is decomposed by discharge through the high frequency electrode to perform desired gaseous phase growth on the surface of a specimen, a base plate 9 for supporting a specimen to be treated is made detachable and movable to the main body of the reaction furnace 4 and the take-in and take-out of an assembly including the high frequency electrode is enabled to the interior of the furnace. As a result, dust such as a reaction product adhered to the assembly such as a discharge electrode in the reaction furnace 4 can be easily removed and the swirling-up of dust can be prevented. |
