| 摘要 |
An arrangement and method for the exact, mutual alignment of a mask and a semiconductor wafer in a lithographic apparatus so that the mask and wafer are in a plane extending perpendicular to the particle beam. The apparatus includes a seating arrangement for the mask having a first retaining part and arrangement for positioning this first retaining part relative to a table which allows adjusting the plane of the first retaining part. The apparatus also includes a second retaining part for securing the wafer thereto, which second retaining part is mounted on the plate by an arrangement that allows adjusting the plane of the second retaining part relative to the axis so that the surface of the semiconductor wafer can also be placed in a plane extending perpendicular to the beam direction. |
