发明名称 FORMING DEVICE FOR COMPOUND THIN-FILM
摘要 PURPOSE:To equalize the distribution of reactive-gas ions on a substrate, and to obtain a homogeneous compound thin-film extending over a wide area by mounting a meshy electrode to either one or both of an ionizing electron leading-out electrode for a reactive gas or an accelerating electrode. CONSTITUTION:A meshy electrode 22 is fitted into the surface approximately vertical to the progressive direction of a reactive gas to an electron leading-out electrode 19 for ionizing the reactive gas and an accelerating electrode 21 for the reactive gas. When the reactive gas 20 is injected toward a substrate 16 from a nozzle 5 for the reactive gas, the reactive gas 20 is ionized, and is further accelerated and collides with the substrate 16. The distribution of reactive- gas ions is equalized on the substrate 16 by the action of the meshy electrode 22 set up to the electron leading-out electrode 19 for ionizing the reactive gas and the accelerating electrode 21 for the reactive gas at that time, a reaction with the clusters 14 of a deposited substance progresses in the vicinity of the substrate 16, and a homogeneous high-quality compound thin-film is shaped extending over a wide area.
申请公布号 JPS6329925(A) 申请公布日期 1988.02.08
申请号 JP19860172717 申请日期 1986.07.24
申请人 MITSUBISHI ELECTRIC CORP 发明人 YAMANISHI KENICHIRO;KAWAGOE YASUYUKI;ETSUCHU MASAO
分类号 H01L21/203;H01L21/027;H01L21/26;H01L21/30 主分类号 H01L21/203
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