| 摘要 |
PURPOSE:To obtain an even plating with high efficiency in a short time by placing a vessel horizontally, rotating the vessel on its axis, inserting a liq. feed nozzle into the vessel to supply a processing soln., extracting the nozzle after treatment, inverting the vessel to discharge the residual soln., and repeating the process for each plating stage. CONSTITUTION:The vessel 1 to be plated is horizontally placed and rotated on its axis, the liq. feed nozzle 4 is inserted into the vessel by a cylinder device 7, and pure water is firstly supplied to the vessel 4 from a pure water tank 11 through a liq. feed port 6 and a connecting hose 9 to wash the inside of the vessel 1 (wash stage). After washing, the nozzle 4 is extracted from the vessel 1, the vessel 1 is inverted as shown by the single dot chain line to discharge the residual processing soln. in the vessel 1 into a residual soln. receiver 10, the residual soln. is returned to the tank 11, and again the vessel 1 is horizontally placed. The soln. to be supplied to the nozzle 4 is changed to another specified processing soln., a vessel is plated in the same procedure by an ordinary plating process, and the process is repeated. |
