| 摘要 |
An oven is described which is especially adapted to maintain accurate and uniform temperature control. The device of the invention includes a central treatment chamber surrounded by a plenum chamber which, through a number of spaced apart apertures introduces gases at a preselected temperature and elevated pressure into the treatment chamber. The plenum chamber is configured to insure a substantially uniform pressure at each of the apertures to provide a uniform flow of temperature regulated gases through each of the apertures.
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