发明名称 FORMATION OF PHOTO ABSORBING PATTERN
摘要 PURPOSE:To eliminate environmental pollution by mist, stabilize oxidation capability of solution and improve mass-productivity by using a particular decomposition agent under the specified conditon, on the occasion of forming a photo absorbing pattern by convering the pattern polymerized with photo sensitive polyvinyl alcohol with a photo absorbing film and then removing the film through decomposition. CONSTITUTION:As a decomposition agent of polyvinyl alcohol, aqueous solution of periodate or a salt of one or more kinds of barium, sodium and potassium with 0.006-0.2wt. percentage is used and a temperature at the time of decomposition is set to 35-75 deg.C. Thereby, the object is attained at a very low concentration and it is superior from the point of view of safety for human body. The range where concentration of oxidizing agent is about 0.2wt% or more is not desirable because an adverse effect appears on the bonding strength of phosphor stripe, following the manufacturing process of photo absorbing pattern. Namely, in case concentration of oxidizing agent is high, it is absorbed and remains on the internal surface of panel and as a result bonding strength of PVA which is binder of phosphorus is deteriorated.
申请公布号 JPS59214128(A) 申请公布日期 1984.12.04
申请号 JP19830088424 申请日期 1983.05.18
申请人 MITSUBISHI DENKI KK 发明人 NOJIMA KENJI
分类号 H01J9/227;H01J29/28;(IPC1-7):H01J9/20 主分类号 H01J9/227
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