| 摘要 |
PURPOSE:To improve durability and anti-abrasive property of a substrate, and to give the anti-clouding effect having less tendency for generating a storage deterioration to the substrate by forming a silicon oxide film on the surface of the substrate which is effected a cleaning treatment. CONSTITUTION:The surface of the substrate 1 to be effected the anti-clouding treatment is cleaned with for example, trichlene or acetone and alcohol, etc. The washing is effective to be a steam-washing and a super-sonic washing, etc., and a plasma-washing is used as a high washing method. In the plasma washing, argon and oxygen gases are effectively used. Especially, when oxygen gas is used for the cleaning of the substrate, the effect of adhesive property between the substrate and the coating film in a film forming step which is effected in the following step is obtd. Thus, the anti-clouding silicon oxide film 2 is formed on the substrate 1 which is effected the cleaning treatment of the surface thereon. The method for forming said film 2 comprises a vacuum- evaporation and a high frequency ion-plating. |
