| 摘要 |
PURPOSE:To quickly determine a resulting value near to the true value by means of a computer for analysis of mask patterns, by reducing the patterns in an integrated circuit to determine resistances and their values. CONSTITUTION:A minimal width W4 is first extracted from a pattern 1. The pattern is then reduced to a half width of W4. A pattern W5 small in width next to W4 is then extracted. A patterning part (a, b, c, d) having a width is reduced to a half width of W5. Such operations of extraction and reduction are repeated until all the smallest widths of the patterns become zero. As regards computing resistances in the parts becoming zero in their pattern widths, the first part becoming zero, that is, the d-e part of the reduced pattern 4 is made to have a resistance expressed in Rde (fs, W4, lde). The resistances are determined in the same way. A resistance path from the contact parts 2 to 3 can be formed by connecting the determined resistances R2f, Rfg, Rgd, and Rde. |
